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High density and patternable growth of silicon, germanium and alloyed SiGe nanowires by a rapid anneal protocol
Bezuidenhout, M,Kennedy, T,Belochapkine, S,Guo, Y,Mullane, E,Kiely, PA,Ryan, KM
(2015)
High density and patternable growth of silicon, germanium and alloyed SiGe nanowires by a rapid anneal protocol in Journal Of Materials Chemistry C 10.1039/c5tc01389e